PAMA ANNOUNCEMENTS

Set against the dramatic backdrop of the iconic Flatiron mountain range, Photopolymer Week 2025 kicked off with the PAMA Workshop on September 15th at the University of Colorado Boulder.

The workshop featured four dynamic panels on photopolymer additive manufacturing. Moderators guided highly interactive sessions that encouraged audience participation and cross-disciplinary dialogue.

The first panel, Current State of Photopolymer 3D Printing and Beyond, was moderated by PAMA board member Vince Anewenter and featured Matthew Menyo (Carbon), Johanna J. Schwartz (Lawrence Livermore National University), Katie Weimer (GenesisTissue Inc.), and Jonathan Anderson (Arkema). The broad range of perspectives, including a national lab, biomaterials startup, AM manufacturing, and materials supplier, provided a wide-ranging overview of additive manufacturing now and into the future. 

Panel II: Regulations, Safety, and Standards in a Changing Landscape, included a dynamic conversation between moderator Michael Gould (RAHN USA), panelists Amanda Griffin (UL), Phil Nagel (3D Systems), Dale Babcock (Henkel), Stephen Postle (BCH North America), as well as the entire audience. The discussion centered around the question, "What is the best practice for balancing innovation and regulation?"

Moderator Mike Idacavage (Radical Curing LLC) began Panel III: Materials Innovation, Data, and Practical Challenges with the provocative questions, "What's standing in the way of creating new materials? What qualifies as a new material?" Panelists Wyatt Levy (Albert Invent), Jeff Stansbury (CU Anschutz), Stefan Hinote (Henkel), and Arminas Ilginis (Ameralabs) shared their opinions.

The PAMA workshop concluded on September 16th with Panel IV: Establishing Standards for Volumetric Printing: Lessons from the Vat Photopolymer Community. Moderator Camila Uzcategui (Manifest Technologies) explored emerging technologies and creating new standards with panelists Maxim Shusteff and Martin de Beer (both from Lawrence Livermore National Laboratory), Chi Chung "Alvin" Li (University of Colorado Boulder), and Neil Cramer (Arkema).

PAMA extends a huge thank you to all speakers and attendees for making this year's workshop such a success!

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