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PHOTOPOLYMER ADDITIVE MANUFACTURING ALLIANCE


Alliance Overview and Opportunities for Photopolymer Materials and Systems Characterization

November 17-18, 2021, 1:00 PM – 3:00 PM EDT (Virtual)


WEDNESDAY, NOVEMBER 17


Material Characterization Panel

This panel that will provide an open discussion regarding the state-of-the-art in the tools and methods to characterize PAM materials. Panelists include:

  • Jeff Stansbury, University of Colorado Denver Anschutz (Technical Leader)
  • Stephanie Benight, Tactile Material Solutions
  • Jeff Klang, Arkema
  • H. Jerry Qi, Georgia Institute of Technology

Moderators:

  • Jason Killgore, NIST
  • Mike Idacavage, Radical Curing

THURSDAY, NOVEMBER 18


System Characterization Panel

This panel will provide an open discussion regarding the state-of-the-art in the tools and methods to characterize PAM systems. Panelists include:

  • Maxim Shusteff, Lawrence Livermore National Laboratory (Technical Leader)
  • Robert McLeod, University of Colorado Boulder
  • David Walker, Azul3D
  • Cameron Miller, NIST
  • Xiayun Zhao, University of Pittsburgh

Moderators:

  • Callie Higgins, NIST
  • Dianne Poster, NIST
Recorded Panel Video

RadTech International North America | The Association for Ultraviolet and Electron Beam Technologies
6935 Wisconsin Ave, Suite 207, Chevy Chase, MD 20815 | (240) 497-1242 | uveb@radtech.org

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